Tuubooyinka foornada ee dahaarka leh ee CVD

Semixlab, waxaan ku takhasusnay bixinta Tuubooyinka Foornada ee CVD SiC ee waxqabadka sare leh oo loo habeeyay jawi wax soo saar semiconductor ah oo adag. Iyada oo la isku darayo substrate xoog badan leh oo leh dahaar Silicon Carbide ah oo aad u saafi ah, tuubooyinka foornada waxay bixiyaan xasillooni kuleyl oo heer sare ah, iska caabinta daxalka, xakamaynta wasakhowga, iyo cimri dheer.

Tuubooyinka foornada ee dahaarka leh ee Semixlab CVD SiC waxaa si weyn loogu isticmaalaa foornooyinka faafinta, nidaamyada oksaydhka, falgalayaasha epitaxy, qalabka koritaanka kiristaalka SiC, iyo nidaamyada farsamaynta faakuumka heerkulka sare leh.

Waa maxay Tuubooyinka Foornada ee Dahaarka leh ee CVD SiC?

Tuubada foornada ee dahaarka leh ee CVD SiC waa qaab-dhismeed isku dhafan oo ka kooban walxo substrate ah oo si taxaddar leh loo soo xulay (High-Purty Isostatic Graphite) oo lagu dahaadhay lakab cufan oo ah Silicon Carbide (SiC) oo saafi ah iyada oo loo marayo tiknoolajiyada Kaydinta Uumiga Kiimikada.

Nidaamyadan agabka ah, graphite isostatic saafi ah oo sarreeya oo lagu daray dahaarka CVD SiC ayaa si weyn loogu aqoonsaday mid ka mid ah xalalka ugu waxtarka badan ee qalabka wax lagu farsameeyo kulaylka semiconductor-ka. Astaamaha Jireed ee Tuubooyinka Foornada ee Dahaaran ee CVD SiC

Dusha sare ee CVD Silicon Carbide

Lakabka CVD SiC wuxuu bixiyaa:

● Nadiifnimo aad u sarreysa oo leh wasakh bir ah oo aad u yar

● Qaab-dhismeedka yar yar ee cufan, aan daloolin

● Iska caabin oksaydh oo aad u fiican

● Iska caabin heer sare ah oo ka dhan ah gaasaska habka daxalka

● Waxqabad yar oo soo saarista walxaha

● Substrate-ka Garaafiga Isostatic-ka ah ee Nadiifka Sare leh

Substrate-ka Isostatic Graphite wuxuu ka qaybqaataa:

● Kontoroolka kulaylka oo aad u fiican

● Qaybinta kulaylka oo isku mid ah

● Iska caabinta shoogga kulaylka oo sarreeya

● Cadaadiska ballaarinta kulaylka oo hooseeya

● Qaab-dhismeed fudud laakiin farsamo ahaan adag

Isku-darkaani wuxuu awood u siinayaa tuubooyinka foornada inay si kalsooni leh ugu shaqeeyaan jawi heerkul sare leh oo ka sarreeya 1400°C iyagoo ilaalinaya xasilloonida cabbirka iyo nadaafadda habka.

Maxaad u dooranaysaa Semixlab?

Semixlab waxay diiradda saareysaa bixinta agab horumarsan iyo qaybo sax ah oo loogu talagalay qalabka wax soo saarka semiconductor-ka.

Awoodeena waxaa ka mid ah:

● Khabiir ku ah agabka habka kuleyliyaha semiconductor-ka

● Wax soo saarka qaybaha graphite iyo SiC oo saafi ah

● Tiknoolajiyada dahaarka CVD ee horumarsan

● Xalalka injineernimada gaarka ah

● Silsilad sahay oo tayo leh oo la isku halleyn karo

● Taageerada codsiyada SiC, GaN, silicon, iyo semiconductor-ka isku dhafan

Iyada oo la isku darayo khibradda sayniska agabka iyo khibradda warshadaha semiconductor-ka, Semixlab waxay ka caawisaa macaamiisha inay horumariyaan xasilloonida habka, yareeyaan khataraha wasakhowga, iyo inay kordhiyaan cimriga adeegga qalabka.

Hadday tahay inaad horumarinayso foornooyinka faafinta, fal-galayaasha epitaxy, nidaamyada koritaanka kiristaalka SiC, ama qalabka farsamaynta kulaylka ee horumarsan, Semixlab waxay bixisaa xalal tuubo foorno ah oo CVD SiC ah oo loogu talagalay in lagu daboolo shuruudaha adag ee wax soo saarka semiconductor-ka casriga ah.

Maanta la xiriir Semixlab si aad ugala hadasho shuruudaha codsigaaga oo aad u ogaato sida tuubooyinka foornada ee dahaarka leh ee heerka semiconductor-ka CVD SiC ay u kordhin karaan waxqabadkaaga habka iyo isku halaynta hawlgalka.

Codsiyada wax soo saarka Semiconductor

Isku-darka substrate-ka saafiga ah iyo dahaarka CVD silicon carbide ee cufan wuxuu u suurtogeliyaa tuubooyinkan foornada inay si kalsooni leh u shaqeeyaan iyagoo adeegsanaya habab badan oo wax soo saar semiconductor ah. Nidaamyada faafinta iyo oksaydhka kuleylka, dusha sare ee SiC-ga lagu dahaadhay waxay bixisaa iska caabin aad u fiican jawiga oksaydhka heerkulka sare leh iyadoo la yareynayo soo saarista walxaha iyo wasakhda birta ah. Fosfooraska hoose iyo firfircoonida kiimikada ee lakabka CVD SiC waxay gacan ka geystaan ​​​​ilaalinta isku-dheellitirka habka inta lagu jiro wareegyada wax soo saarka ee dheeraadka ah.

Codsiyada koritaanka epitaxial, oo ay ku jiraan silicon, silicon carbide (SiC), iyo wax soo saarka semiconductor-ka isku dhafan, nadiifinta tuubada foornada iyo xasilloonida kulaylka ayaa lagama maarmaan u ah helitaanka dhigista filim isku mid ah iyo natiijooyinka habka soo noqnoqonaya. Dahaarka SiC ee cufan wuxuu u shaqeeyaa sidii caqabad ilaalin ah oo ka dhan ah gaasaska habka daxalka iyadoo la ilaalinayo astaamaha kulaylka ee looga baahan yahay xakamaynta heerkulka saxda ah ee qolka falgalka oo dhan.

Soo saarista semiconductor-ka korontada ee horumarsan, gaar ahaan wax soo saarka qalabka SiC iyo GaN, tuubooyinka foornada ee dahaarka leh ee CVD SiC waxay gacan ka geystaan ​​​​hagaajinta xasilloonida goobta kulaylka, yareynta khataraha wasakhowga, iyo hagaajinta isku halaynta qalabka. Awooddooda ay u adkeysan karaan wareegga kulaylka ee soo noqnoqda heerkulka sare iyo xaaladaha faakiyuumka ayaa ka dhigaya xal agab oo la doorbido nidaamyada koritaanka kiristaalka, qalabka daminta, iyo qalabka kale ee muhiimka ah ee farsamaynta kulaylka.