Tantalum Carbide Dahaarka Garaafka Dahaarka leh

Tantalum Carbide (TaC) Dahaarka Graphite Susceptor oo ka socda Semixlab waxaa loo naqshadeeyay habka ugu baahida badan ee MOCVD hababka soo saarista semiconductor. Muujinaya iska caabin heerkul sare oo gaar ah, ilaalinta daxalka oo heersare ah, iyo wasakhowga walxaha la yareeyay, waxay hubisaa tayada wafer-ka sare, cimriga qaybta la kordhiyay, iyo hoos u dhaca nidaamka.

Marka la isku daro substrate garaafyada adag iyo lakabka ilaalinta horumarsan ee TaC, dulmanahani waxa uu gaaraa dheelitirka saxda ah ee kuleyliyaha kulaylka, xasiloonida kiimikada, iyo nidaamka nadiifinta, taas oo ka dhigaysa xalka la door bidayo ee GaN, SiC, iyo epitaxy semiconductor.

Tantalum Carbide (TaC) Dahaarka Garaafyada Dahaarka ee MOCVD

Semixlab TaC dahaarka dahaaran waa qayb hadaf-muhiim u ah reactor kaaga MOCVD, oo fulinaya saddex hawlood oo muhiim ah:

Taageerada Wafer & Kululaynta lebbiska: Laga sameeyay cufnaanta sare, garaafka aadka u saafiga ah, kuwa shakiyagu waxay u dhaqmaan sidii madal adag oo loogu talagalay waferradaada. Waxay bixiyaan kulaylka caadiga ah ee aan caadiga ahayn iyo lebbiska heerkulka saxda ah ee dhammaan dusha sare ee waferka, kaas oo muhiim u ah helitaanka dhumucda lakabka epitaxial joogto ah iyo ka kooban.

Caqabada Kiimikada: Heerkulka sare, jawi cadaadis-sare leh, daahankayaga TaC ee iska leh wuxuu u dhaqmaa sidii caqabad aan toos ahayn. Lakabkan ayaa muhiim u ah ka hortagga falcelinta garaafyada qaawan ee leh gaasaska daxalka ah sida NH3 ama SiH4. Marka la ciribtiro wasakhowga kaarboonka, waxaan kaa caawineynaa inaad gaarto filim nadiif ah oo sarreeya iyo hagaajinta waxqabadka qalabka.

Ilaalinta Reactor: Dabeeyehu waxa uu u adeegaa sidii isku xidhka muhiimka ah ee u dhexeeya waferradaada iyo qaybaha gudaha ee reactor-ka. Kiimikada sare iyo iska caabbinta kulaylka ee daahanku waxay ilaalisaa daacadnimada reactor-kaaga, yaraynta baahida dayactirka joogtada ah iyo wakhtiga dhimista ee qaaliga ah.

● MOCVD (Qaybta Uumiga Kiimikada ee Bir-Organic): GaN, SiC, GaA korriinka epitaxial.

● Habka Epitaxy: Nadiifin sare, lakabyada isku dhafka isku-dhafka ah ee aan cillad lahayn.

● Heerkulka Sare CVD: Bey'ada ilaalinta u baahan sidayaasha waferrada u adkaysta daxalka.

Semixlab, waxaanu ku takhasusnay qaybaha habsocodka semiconductor waxqabadka sare leh. Susceptors TaC Coated Graphite Susceptors waxaa lagu soo saaray si sax ah waxaana lagu mariyaa kontorool tayo adag si loo hubiyo waxqabadka joogtada ah ee khadkaaga wax soo saarka. Nala soo xidhiidh maanta si aad u barato sida Tantalum Carbide Coated Graphite Susceptors ay ugu keeni karaan wax soo saarka semiconductor-kaaga waxqabad aan la mid ahayn.

Faa'iidooyinka Farsamada ee Dahaarka TaC

Barta dhalaalka aadka u sarreeya (qiyaastii 3880°C) - Dahaarka TaC waxay leeyihiin barta dhalaalaysa si aad ah uga sarreeya daaha-dhaqameedka SiC, hubinta waxqabadka xasilloon ee jiilka soo socda, hababka MOCVD ee awoodda sare leh.

Iska caabbinta la xoojiyey ee hydrogen iyo daxalka ammonia - Dahaarka cufan ee CVD TaC wuxuu si wax ku ool ah uga ilaaliyaa graphite falcelinta kiimikada rabshadaha leh.

Caqabadaha faafinta kaarboon - Waxay ka hortagtaa wasakhowga kaarboon ee lakabka epitaxial, hubinta nadiifinta walxaha sare.

Intaa waxaa dheer, lagu hagaajiyay hababka epitaxy-ka ee semiconductor - Dahaarka TaC waxay ku habboon yihiin GaN-on-Si, GaN-on-sapphire, iyo koritaanka waferka SiC.

Marka la barbar dhigo tuhmanayaasha dahaarka leh ee dhaqameed ee SiC-da, xalalka daahan Semixlab ee TaC waxay bixiyaan adkeysiga korodhka, khatarta faddaraynta oo yaraada, iyo habsocodka la isku halayn karo, taasoo ka dhigaysa doorasho aan laga maarmi karin oo loogu talagalay xirmooyinka semiconductor sare.